High frequency Plasma processes at various industrial Frequencies (13.56MHz, 27.12MHz up to 80MHz).

Various methods of generating Plasmas are used for this. The most common are the Application of High-Frequency AC Voltages (40 kHz or 13.56 MHz) and excitation with Microwaves. Typical gas mixtures include Oxygen, Argon, and sometimes Hydrogen and Carbon Tetrafluoride (CF4). The mixture depends on the special requirements of the Cleaning Process, which result from the type of Contamination and the Material being treated. There are hardly any restrictions on the Material to be cleaned. Temperature-sensitive Plastics can be treated as well as Metal, Glass and Ceramics. In any case, the Plasma System must be adapted to the respective task.

Plasma Enhanced Chemical Vapour Deposition (PECVD)