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Dry etching process for accelerated surface cleaning

Dry etching process for accelerated surface cleaning by Aurion Anlagentechnik GmbH

Aurion Anlagentechnik GmbH

63500-D Seligenstadt
        14 Am Sandborn

+49 6182 96280

+49 6182 962816

Dry etching process for quick surface cleaning


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Beschreibung
The RIE process (Reactive Ion Etching) is a dry etching process, which is mainly used in electronics and microelectronics production for rapid surface cleaning or activation, for ashing photoresist or for structuring circuits on semiconductor wafers.
Produktparameter

Coating

Activation of Plastic Surfaces

High degree of degreasing

Activate and clean surfaces

High clearance

Bilder

Dry etching process for accelerated surface cleaning


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